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Expression profile for YPR175W (YPR175W)

Description : Second largest subunit of DNA polymerase II (DNA polymerase epsilon); required for maintenance of fidelity of chromosomal replication; essential motif in C-terminus is required for formation of the four-subunit Pol epsilon; expression peaks at the G1/S phase boundary; Cdc28p substrate [Source:SGD;Acc:S000006379]

Sample enrichment: gal, 4h + hu 200 mm,WT (SPM: 0.3, entropy: 3.74, tau: 0.63)
Perturbation specificity: Gal (SPM: 0.58, entropy: 2.75, tau: 0.64)

All conditions


Perturbation specificity

Note: SPM calculations for this profile are done using the maximum value.